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Chee et al.
(54)
(51) Int Cl
(22)
Filed:
(57)
2010.
ABSTRACT
Oct. 6, 2011
(62)
(200601)
(200601)
B01] 8/26
(21)
Publication Classi?cation
C023 3/027
(76) Inventors:
tion FBRs.
TCS= so
TCS= 47 I
4-6
MGSi=11
Si = 1
4-2
TCS = 420
HCL=42
'
STC
= 2.6
TCS=294
TCS=126
TCS
TCS =294
STC = 94.5
STC=166
43
4-1
1 STC =e3.5
FOR SILICA
STC
US 2012/0114546 A1
1507,
7-503, 75-12,
7711261
4, 775268
TE-09
TE-IU
430
TIE
26C
250
260
320
TE-26D
371]
270
280
330
380
290
340
3
300
350
310
360
420
Minutes
Fig
. 1
US 2012/0114546 A1
TE26B,
7526
C)
TE26D
72429
330
320
310
300
290
300
7212
270
20:35.31
350
20:38.24 203907
340
\775427,
15418,
TIE-26A,
20.13%50
Fig. 2
US 2012/0114546 A1
25
20
Deg C
15
HCI. CUT\
MGSI
HCLCUT\
250.11)
35
30 I
MQIICHARGER;
L
27000
290.00
310.00
330.00
Minulm
Fig.
3
350.00
37000
39000
US 2012/0114546 A1
STC = 29
TCS=294
TCS=132
TCS
1-4
STC
TCS=44 A
TCS= 44
CS= 470
Si = 1
STC = 29
1-6
1-2
TCS = 426
Fig.4
STC = 166
1-3
US 2012/0114546 A1
20-U
28
Fig.
5
US 2012/0114546 A1
000o000
000
0000 0000
0O
O
O
O
0
0
0
0
0000.1Q
000000
000000000
000
00004
0000000000o
00000000000000000000000
0000000
00000000
000000 000000
00000
000 000
Fi
g.
6
US 2012/0114546 A1
ST; = 2.3
TCS=132
TCS
=294 $TC=166
TCS
2-5
TCS= 44TCS= 47 Si
2-6
STC = 166
23
24
= 1
2-2
TCS = 416
Fig. 7
TCS=294
US 2012/0114546 A1
STC = 767
TCS=294
STC=166
TCS
=
294
Si=11
TCS=176
3-1
STC = 624
TCS=176
TCS=47
3-5
TCS
=
294
Fig
. 8
US 2012/0114546 A1
STC = 2.6
TCS=
STC=
TCS=126
TCS
TCS =294
sTg = 94.5
4-1
4-4
1 s
TCS= 5o
TCS= 47
'
Si
STC
= 1
4-6
42
TCS = 420
Fig. 9
TCS = 50
TCS= 50
CS= 470
Si = 1
STC = 33.3
5-6
5-2
TCS = 420
TCS=126
TCS
51
TC$=294
STC = 94.5
56
5-1
STC = 63.5
FOR SILICA
STC
Fig. 10
US 2012/0114546 A1
Ma
y
10
,
20
12
US 2012/0114546 A1
MT/YR
DESCRIPTION
OF PRIOR
ARTS
producing
TCS
lane)
by
contacting
(Trichlorosi
directly
HCL
With
MGSI
(Metallurgical
Grade
2010.
FBR
Reactor)
from
and
Bed
depositing
polysilicon
quartZ
Silicon)
(FluidiZed
tube
after
in
separating
TCS
et al. illustrates a
generating
TCS
by
Traditional
TCS-Siemens
process
is
[0006]
US.
Pat.
No.
3,704,104 to M. S. BaWa,
et al. illus trates an
operation condition of FBR
for maximum produc tion
of
TCS
by
direct
chlorination
of
MGSI.
Dilution of HCl gas With
nitrogen is suggested.
[0007]
US.
4,044,109
Pat.
to
KotZsch,
No.
H.
J.
et
illustrates
increasing
TCS
al.
method
of
production
by direct chlorination of
polysilicon
MGSI
in
continuously
direct
to
convert
STC
from
the
CVD
reactors
into
TCS
and
exothermal
reaction.
heat
of
the
[0008]
(FluidiZed Bed Reactor) for TCS generation and STC con version
4,213,937
direct
proved
granular
as
successful
commercial
polysilicon
pro
cess
for
US.
Pat.
No.
to
Padovani,
et
chlorination
of
MGSI.
deposition
of
polysilicon.
[0009]
US.
Pat.
illustrates
of
MGSI
(Metallurgical
Grade
Silicon),
is
asked
by
many
MT/YR
polisilicon.
But,
after
2011
many
bigAsian
chemical
No.
method
direct
chlorina
MGSI
from
tion
FBR
of
of
by
intermediately
continuous operation.
process
has
limit
in
scale
up
due
to
its
inherent
problem
of
generating tWo times of STC than TCS at the same time. For, 10,000
MT/Y
polysilicon
plant,
the
amount
of
STC
recycling
in
the
[0010] US.
Application
No.
injecting
Patent
Publication
20100264362
Recycling the huge amount of STC costs more operation cost and
al.
by
of
Wherein
illustrates
control
CHEE,
a
ling
direct
et
method
?uidized
chlo
ment.
US.
Pat.
No.
4,676,967 to William C.
[0011] Investor Relation Book issued by Hankook Silicon Breneman
illustrates
disclosed that their commercial FBR built by the applica process
of
generating
tions description, under contract, produces crude TCSTCS plus STC from FBR
The equipment
bines
silicon
the
is for
reaction
of
tetrachloride
and
hydrogen
silicon
With
loWer
changed
into
into
silane
a
FBR
portion
of
in
operating at temperature
[0012] US. Pat. No. 2,406,605 to Schenectady illustrates range of 400 to 600 C.
hydrogenation of STC in the presence aluminum granules at
and pressure range of 300
to 600 psi.
400 C.
All
the
[0013] US. Pat. No. 2,458,703 to David B. Hatcher [0017]
equipment.
Reaction
hydro
chloride
gen
the
of
With
of
the
equipment.
and
for
of STC.
illustrates
pounds.
convert STC.
US.
[0015] US. Pat. No. 2,595,620 to G. H. Wagner, et al. [0018]
4,526,769
to
illustrates hydrogenation of STC in the presence of MGSI at
Pat.
William
controlling
trichloro-silane
exothermal
and
actual
reac
No.
M.
various temperatures, pressure and retention time of STC inIngle, et al. illustrates a
for
producing
the reactor. Yield of TCS is less than 20% and the yield process
increased as the retention time increases.
that
equip
Ma
y
10
,
20
12
US 2012/0114546 A1
KWhr
per
year
from
TCS
polysilicon
compared
FBR
for
producing
polyethylene
and
polyole?ns
of
polypropylene
high
and
capacity
density built
With
plant
a
polysilicon
same
plant
licensed
[0020] GT Solar, a US. company, announced a feasibility study Process, the Hybrid
TCS-Siemens
Process
and
their
Closed
Loop
Process
Hydro
from 10,000
R polysilicon
of the plant Which can be MT/Y
7,000 MTA. But, even that plant.
BRIEF
DESCRIPTION
OF DRAWINGS
process
to
reduce
energy
consumption
equipment
and
FIG. 1 is a
temperature pro?le inside
of a FBR
to
take
advantage
of
scale
merit
of
the
polysilicon
plant.
inside
of
operating
FBR
direct
chlorination
of
MGSI
With
turbo charger,
Which is inert charging
material, along the reaction
time.
[0025]
FIG.
average
deviations
uidiZing
is
mean
temperature
inside
bed
for
of
the
?
MGSI
the
presence
of
turbo
chlorination
FBR
equipped
TCS-Siemens
process
shoWing
turbo charger.
[0028] FIG. 6 is an elevated
vieW of a gas distributorused
in
the
FBR
presence of
turbo charger.
10,000
MT/Y
polysilicon
plant,
the
amount
of
STC
method
of
saving
electricity
and
investment
cost
from
plants
siZe
over
10,000
MT/YR
is
pro
vided.
Three
hybrid
TCS-Siemens
equipped
With
direct
Patent
Application
Publication
No.
20100264362
of
the
MGSI
direct
chlorination
For,
of
for
HoWever, the closed loop hydro chlorina tion process has limit
in
the
[0029] FIG. 7 is a
schematic block diagram of
Turbo
Charger direct
chlorination FBR equipped
TCS-Siemens
process shoWing TCS and
STC mass How in a 10,000
MT/Y R
polysilicon
plant.
[0030] FIG. 8 is a
schematic block diagram of
Closed
Loop Hydro chlorination
FBR equipped TCS-Siemens
pro
cess shoWing TCS and STC
mass How in a 10,000 MT/Y
R
polysilicon
direct
plant.
plant.
chlorination
running
With
old
should
TE-26A
indicate
doWn
to
at
continuous
to
TE-26D
temperature
corners
readings
of
plate,
gas
Which
four
distribution
placed
at
the
to
TE-11,
the
number
ver
FBR
With
interval
of
FBR
chlorination
thermocouples
method,
of
loWer
section
of
every
2
TCS
direct
be
shut
months.
For
production,
at
least
operation.
[0035] FIG. 2 is a temperature
pro?le
inside
of
operating
chlorination
FBR
direct
of
MGSI
With
turbo charger,
Which is inert charging
material, along the reaction
time. The
of
all,
the
temperature
?uidiZing
increased.
direct chlorination of MGSI only With MGSI and HCl, like an old of
steady
such
increase the,
inside
bed
Because
temperature
turbo
charger
is,
including
Ma
y
10
,
20
12
US 2012/0114546 A1
hotter
than
the
average
Davison
952,
quartz
powder,
glass
beads,
powder,
sapphire
powder,
garnet
powder,
opal
compound.
The
turbo
charger
should
have
elemental
SiO2
Table 1.
the
such
100~150
0.98~1.02
1.98~2.01
the
at
the
chlorina
tion
of
plug
the
viscous
and
of
holes
of
reside
FBR
gas
to
distribution
number
means
distance
>0.1
temperature
equivalent
to
reading
from
internal
diameter
of
and
do
not
temperature
thermo
lower
from
six
different
temperature.
and
the
bed
[0039]
built
applicants,
produces
built
marked
at
each
the
U.S.
patent
Before
the
of
the
applicants
turbo
charger
direct
addition
temperature
in
[0040]
charger.
between
design
the
development
every
deviations
to
crude
reaction
the
reported
application
averaging
is
with
purity
applicants
is
95%
by
control
CHARGER
contract
disclosed
direct
MGSI/
direct
which
rination
the
FBR,
under
previous
and
According
commercial
chlorination
temperature deviation when MGSI and HCl react accord ing to old
method
is
controlled within
tion time laps are recorded. The MGSI marked line shows the
chlorination
bed.
happens
temperature
?uidiZing
temperature
average
gas,
un-plugged
the
the gas distribution plate and two points inside of the ?uidiZing
temperature
reactant
to
is
of
the
same
the
shifts
plate
And
with
almost
distribution
inside
direct
MGSI
couples locates vertically away from the bottom of the FBR with
mean
molecules
bottom
of
products.
pro?le
are
silicone
are
bed
molecular
silicone
HCl,
of
high
plugged,
Properties
interval
and
products,
TABLE 1
the
reaction
unwanted
as
weight
gas
TE-11,
desired
generates
increases
steadily
to reach over 5000
C.
At
this
temperature most of
and
to
to
chlo
could
hot
must
4
that
not
exothermic
shut
down
months.
In
there
is
MT/Y R Capacity
[0041]
gas rate and compositions are regarded all the same in every
different process. Typically, one commercial CVD reactor produces
200 to 500 MT/Y R of polysilicon. For con venience, all the CVD
CVD
[0043]
As
Meanwhile,
470,000
MT/Y
assumedbefore
R
of
TCS
is
(1-1)
equipped
TCS-Siemens
(1
-2)
to
produce
(1-4)
genation.
10,000
MT/Y
polysilicon.
the
be
STC
of
of
294,000
Then
All
to
and
Once
mixture.
thermal
reactors
as
These
un-reacted
mixture
gases
process also
includes
separator
TCS and STC mass ?ow in case of 10,000 MT/Y R system (not shown in the
polysilicon plant. Due to the heat transfer limit shown in drawing) to separate TCS and
the previous section, at least four small FBR are needed to STC. TCS, after separated from
pro duce enough TCS for 10,000 MT/YR polysilicon plant as STC, is recovered and returned
shown in the FIG. 4. In addition to the often shut down, the into the
the
STC
goes
converter
into
(1-4)
the
about
at
one
pass.
Then,
the
mixture
is
intro
duce
selectivity of crude TCS from the FBR is 60% and most of the
bed temperature
returns to the
is
thermal
reactors
showing
into
converters
CVD
[0042] FIG. 4 is a schematic block diagram of old direct recovery) system (1-3) that
chlorination
transferred
STC
of
CVD
MT/Y R.
(1-2).
the
reactors are presented as one block diagram. Unit of the numbers MT/Y R of TCS comes out of the
reactors
Ma
y
10
,
20
12
US 2012/0114546 A1
10,000 Kg/hr.
is
chosen
material,
compounds,
from
solid
except
iron
that
With
system of the OGS system (1-3). Since 470,000 MT/Y R of TCS is chemicals
does
any
kind
of
than
20
degrees.
(20)
via
(32).
the
The
MGS1
MGSI
feeder
feeder
(32)
supposed
needed to produce 10,000 MT/Y R, additional 44,000 MT/YR of TCS to be generated during the
is
generated
from
direct
chlorination.
But,
for
old
direct hydro
Which
not
smaller
chlorination
chlorination reactor the selectivity of TCS is 60% and the rest of silicon
at
40%
up
of
1).
reaction
[0052]
6000
C.
generated. This STC can be converted to TCS after separated from and reaction pressure of 30
third separator system (1-6). The third separator system (1-6) bar.
of
may roles as another separator system (1-5) and the separator [0051] Another poWder feeder,
recycling
is
STC.
Therefore,
29,000
MT/YR
of
unWanted
extra
STC
is temperature
to
the
cyclone
PER
(20)
(37)
and
is
via
line
(39)
that
point
(40),
just
reaches
(1-3).
[0044] But, if this extra TCS is returned into the recycle (33) that reaches a point (34)
stream, the TCS balance is broken. Therefore, the extra STC can be just beloW the upper end (35)
sold to other customer or converted into TCS for emergency TCS
of the loWer reactor section
supply or sold to customers Who need TCS.
an angle
from
(27)
vertical
line
degrees.
extended
from
(27),
the
Which
Wall
(41)
of
is
the
vertical
smaller
Plu
thermocouples
line
than
20
ralities
(51),
of
to
36,
gas
distribution
plate
(24),
[0046] In the loWer reactor section (21) of the PER (20), the ratio
of the height of the straight Zone (H') over internal diameter (D1)
is ?xed betWeen one to eleven. Cooling jacket
gas
distributionplate
(24),
Which
has
pluralities of small holes (6) and chevron type hole caps (4-1)
as shoWn in the FIG. 6, is installed at the bottom of the loWer
reactor
section
(21).
An
expanding
Zone
(25)
maintains
an
angle (26) from a vertical line (27), Which is extended from the
Wall
of
the
loWer
reactor
section,
smaller
than
degree
and
and
to
36
thermo
PER (20).
[0053] FIG. 7 is a
schematic block diagram of
Turbo
Charger
direct
chlorination FBR (2-1)
equipped
TCS-Si
emens
process shoWing TCS
mass How in a 10,000
MT/Y
(28) reaches over tWo times of the inner diameter (D1) of the loWer
Due
transfer
inside
uidiZing
bed,
upper reactor section (28) via a ?ange (30) for easy replace
produces
polysilicon
STC
expands until the inner diameter (D2) of the upper reactor section
and
to
plant.
ef?cient
heat
of
the
the
crude
turbo
TCS
With
is
5%.
reactors
(2-2)
470,000
MT/Y
introduced
Since
are
R
into
the
the
of
CVD
CVD
same,
TCS
is
reactors
of
polysilicon.
Then
294,000
turbo charger feeder (31-1) shoWs 15% accu racy of feeding the
turbo charger Within the pressure range up to 10 bar and Within the
un-reacted
and
166,000
294,000
stream. Once the STC goes into the thermal converter (2-4) about
20% of STC is converted into TCS at one pass.
Then, the converted TCS and un-converted STC mixture is introduce
additional
54,000
MT/Y
of
TCS
is
gener
ated
from
direct
chlorination. Since the turbo charger direct chlorination FBR (21) shoWs 95% TCS selectivity, about
and
saved
electricity
as
emergency
consumption
by
TCS
source.
the
HoWever,
thermal
still
the
converters
is
High Pressure.
[0056]
plant.
Ma
y
10
,
20
12
US 2012/0114546 A1
Then
294,000
CVD
reactors
as
un-
[0057] As shown in the many prior arts, the hydro chlorireacted and 166,000 MT/YR of
STC comes out of the CVD
nation reaction as equation (1) has very poor selectivity of
(4-2)
as
gas
system
(4-3)
that
also
a
separator
[0058] In the closed loop hydro chlorination TCS-Si emens includes
process, one hydro chlorination reactor, Which oper ates around 500 C. system for sepa ration of
to 600 C. and 20 to 30 bar, generates TCS and consumes STC at the TCS and STC. 294,000 MT/YR
same time. So all the STC generated from the CVD reactors (3-2) are ofTCS,
after
sepa
rated
sent to hydrogenation FBR after puri?cation in the OGR system (3- from STC, is recovered and
3) and separated in a separator system (3-4). Amount of TCS returned
into
the
CVD
reactors (4-2).
directly returned to
CVD reactors are the same as the tWo previous processes,
modi?cation
is
needed
to
If
all
the
FBR
(4-1),
it
generates
more
615,000 MT/YR of STC is generated at the same time. Then moles of TCS than STC accord
total amount of chlorosilane produced is about 800,000
MT/YR. It is not easy to generate such huge amount of chlorosilane
from one single FBR. Moreover, another huge separator system (3- We have excess TCS that breaks
huge separator
system (3-5)
roles
as
the
steady
balance
state
of
process.
To
undesirable
mass
the
entire
avoid
such
situation,
part
The
amount
of
STC
sales
or
use
in
the
sell
at
other
chemical
?rst
separator
system
(4-3)
[0064]
Then,
94,500
MT/Y R
converted
the
rest
of STC
into
is
126,000
separator
TCS
may
the
10,000
TCS
should
MT/Y
of
generated
be
As
proven
by
the
perature
pro?le
turbo
charger
data,
the
direct
chlorination
of
for
FBR
(4-5)
shoWs
selectivity
crude
over
TCS
95%.
sumption by
TCS
converter
(4-1),
after
separated
from
second
separator
system
(4-6).
is illustrated in
FIG. 9.
(4-6)
and
the
separator
than
The
STC
direct
chlorination
FBR
equipped
Hybrid
TCS-
to
produce
10,000
MT/Y
of
polysilicon.
and
166,000
MT/Y
of
STC
comes
out
of
the
(1).
excess
TCS
steady
state
the
entire
such
to
Then
that
We
the
have
breaks
mass
the
balance
process.
To
undesirable
of
Then process
CVD STC
to
meet
the
is
separator
(5-3)
Then,
situation,
94,500
MT/Y R
TCS
overall
38%
of
STC
converted
polysilicon,
TCS
and
the
is
126,000
total 420,000
to
rest
[0067] These mixture gases are transferred to off removed STC is reacted With
OGR system (5-3) that also includes a separator pure Water to recycle HCl and
system for sepa ration ofTCS and STC. 294,000 MT/YR make SiO2 for sales or use in
ofTCS, after sepa rated from STC, is recovered and the process. Or, the total STC
converted
the
of STC
into
from
is
system
[0069]
The amount of
removed
?rst
avoid
294,000 MT/Y R of TCS comes out of the CVD reactors as un- balance.
reacted
according
the
meet
CVD
the
470,000
10,000
Off
MT/Y
of
MT/Y
R
gas.
assumption
of
TCS
R
only
TCS
To
of
for
of
50,000
[0068] For STC, some technical modi?cation is needed to resolveextra TCS is reserved for emer
problems of inherent hydro-chlorination. If all the STC from gency or sell at other chemical
MT/Y
should
OGR system (5-3) is put into the hydro chlorina tion FBR (5-1),industry after puri?cation in
be
Ma
y
10
,
20
12
US 2012/0114546 A1
(5-2).
the old
traditional TCS-Siemens
process that uses thermal
con
verters, the Hybrid TCSSiemens process, saves
218,201,
STC from the CVD reactors (5-2) are not converted into TCS bydirect chlorination FBR saves
the hydro-chlorination FBR (5-1) to keep the overall TCS78,211,145 KWhr per year
mass How in balance. Instead the un-converted STC is planned than the Closed Loop
to
TCS
KWhr/kg Si
25 bar
electricity
savings.
sale
for
economical
use.
HoWever,
the
old
direct
chlorination FBRs (5-5) produce enough amount of un-Wanted operates at about 550 C. and
TABLE 2
Energy consumption related With
STC conversion and TCS
generation in
Mass to Converter
Converter
Energy
MT/Y R
(A); Closed Loop
TCS-Siemens
TCS-Siemens
(B); Hybrid
TCS-Siemens
(A) (B)
800,000
166,000
94,500
705,500
10 x 10,000,000 =
20 for TC
24 x 10,000,000 =
Chlorination) 100,000,000
4 for DC
240,000,000
1.18 I for HC 2.18 x 10,000,000 =
l for DC
21,800,000
7.818
1*
Energy
consumption
in
Distillation,
Siemens Reactor, and Off Gas Recycle steps are not
considered because they are common steps for all the three
processes.
1*
plants.
Includes
is calculated
by adding the
[0072]
As
Hybrid
equipped
direct
conclusion,
TCS-Siemens
With
processconvert
pluralities
chlorination
theenergy
FBRs
of
are
old
much
STC
to
TCS
and
separation.
The
numbers
are collected
Siemens
process from
equipped With a single
turbo charger direct commercial
[0074]
Table
Process
conversion
for
the
above
mentioned Closed
using
mentioned
TCS-Siemens
tradi
Process,
tional Converter
and
the
above mentioned
Reactor SiZes
and Initial
Capital
Investment
high
temperature of
temperature
550
C.,
betWeen
high
pressure
300~350o C. and
about
pressure
5
FBR
be
the manufactured
above
that
be
25
bar,
must
constructed
With
the
expensive
Incoloy
various
constructio
n materials
Siemens
process
as
in terms of reactor such
siZes due to its carbon
steel,
inherent
less
disadvantage
of stain
and
the
hydro steel,
Inconel.
chlorination.
or
The
Turbo
in
direct
Charger
parison.
The
total
energy Loop
consumption related With TCS Siemens
process
FBR,
chlori
Hybrid
Process,
nation
of
material
safety
In
for
addition
this,
due
internal
structure,
cult
dif?
level
excess
since
prod
and
side
uct,
chlorination
is
FBR
impossible
reactor
US.
Pat.
4,676,967
oper operates
at
to
to
complex
control,
the of
reason.
[0078]
TCS-Siemens No.
is
800
equivalent
MeanWhile,
hydro
and
FBR
adopted
The
energy
most.
Hybrid
TCS-Siemens
Process
Closed
are listed in Table 2 for com The
TCS
at
controlled
[0077]
consumes
ated
[0076] In addition at a
to
loWer
energy range
generation,
plants.
chlorination FBR.
Process con
it
almost
to
build a single
large hydro
Ma
y
10
,
20
12
US 2012/0114546 A1
Due
to
the
effective
control
FIG.
TCS-Siemens Process.
[0079] On the other hand, the Turbo Charger FBR for direct
heat
is
transfer
shoWn
as
in
the
the
uniform
the
?uidizing
bed,
the
reaction zone.
Charger FBR has no internal
it
is
easy
to
commercialized
Carbide
Bubbling
excess
amount
of
MGSI
in
FBR
Without
considering
Uniopl
for
Polyole?n
bed
or
slugging
bed
mode,
is
unstable
and
the
heat
of
the
reaction
is
controlled
by
only
production.
about
Bed
FBR,
[0080] Meanwhile, the other tWo type FBRs are just large Reactor,
Since
100
1980
reactor
of
operation
single
With
out
accident.
any
Maximum
GT
company,
Solar,
US.
announced
[0081] The neW FBR for direct chlorination utilize an inert feasibility
study
report
at
high
temperature,
pressure.
FBRs.
large
polysilicon
scale
plant
over
and
CaPex.
of
Size
and
for
TCS
FBRs
and
20,000
polysilicon
to
three
are
MT/Y
plant
different
summarized
according
processes
in
Table
4.
material
cost
and
direct
In
Process
using
chlorination
this
case,
TCS
due
to
is
possibility
maintenance
needed
of
and
man
the
malfunction
high.
high
In
the
TABLE 3
is
7,000
that
MTA.
number
But,
is
even
for
Old Direct
Cooler
Turbo Charger
Direct
Chlorination FBR
Chlorination FBR
300~350 Medium
gases
Reaction
4~5
Bed Mode
>110O C.
MT/Y
R TCS
Thermal Conductivity 0.1~0.2
W/(mK)
transfer is possible.
Reason
of limit Hot
Spot,
Poor
<11O C. Internals
Cooling Coil,
Bubble
***For
96,000
MTA
Pressure (bar)
A T across bed
Working
build
number
chlorination and the FBR for hydro chlorination dis closed in the [0084] Since this neW Turbo
US. Pat. No. 4,676,967. One key feature ofthe
Breaker
material
heat
TCS at least
288,000
MTA STC is generated
heat
transfer
from steel,
the same
FBR
Construction Material Cabon
SUS,
Incoloy
M
a
y
1
0
,
2
0
1
2
US 2012/0114546 A1
TABLE 4
Size and number ofFBRs for TCS production for 10,000 MTA and 20,000
MTA Polvsilicon plant according to three different processes.
TCS
FBR:
No. of
MT/Y R
FBR
Hybrid
83,000
With Old
(166,000)
D.C. FBR
Hybrid With
53,000
Turbo
(106,000)
D.C. FBR
H.C. Closed
0
Dimension
H.C. FBR
MT/YR
No. ofH.C.
STC Only
FBR
4
8
01.5 m, H 25 m
01.5 m, H 25 m
95,000
190,000
01.5 m, H 25 m
G 2.2 m, H 25 m
95,000
190,000
Loop FBR
Dimension
01.4 m, H 25 m
02.1 m, H 25 m
01.4 m, H 25 m
$2.1m, H 25 m
STC +
No. ofFBR
TCS
400,000
MT/YR
800,000
1,600,000
2
03.0 m, H 25 m
4
03.0 m, H 25 m
mandatory
supplementary
equipment
to
the
FBR,
[0089] On the other hand, Closed Loop TCS-Siemens Pro-cess should also be increased.
does not need separate FBR for TCS production only. HoWever, TCS is As We knoW Well, lnconl 800
H
hard
very
to
Charger FBR, one small Turbo Charger FBR for TCS pro
duction and one small REC type hydrochlorination FBR for
expen
fabricate.
sive
and
And
the
of vessel
TCS-Siemens Process.
is
sels.
Therefore,
the
square
of
diameter
ratio.
[0093]
As
conclusion,
TCS
production
Hybrid
Process
than
for
TCS-Siemens
is
Closed
much
Loop
[0092] In addition to this, the FBR for this process should Siemens Process.
be built With the expensive lnconel 800H to secure the opera [0094]
Hybrid
smaller
TCS-
TCS-
tion conditions of high temperature and high pressure. And at Siemens Process equipped
the same time size of super heater and settler, Which are With
applicants
Turbo
Charger
direct
chlorination
KWhr
per
year
from
TCS
polysilicon
plant
polysilicon
plant
by
Loop
Closed
emens
MT/Y
Process.
R
plant
the
For
built
TCS-Si
20,000
amount
is
156,
000,000 KWh.
[0095] Compared With
traditional
TCSSiemens Process, the
Hybrid
TCS-Siemens
Process
saves
220,000,000
KWhr
per
year from 10,000 MT/YR
plant.
a polysilicon
and
and
a
gas
distribution
plate,
Whose
brim
is
rounded
con
vertical
section and
inner
surface
of
the
loWer
reactor
and
a
n
u
p
p
e
r
degree
and
until
the
diameter
(D2)
expands
inner
r
e
a
c
t
o
r
reaches
of
the
tWo
inner
reactor
section,
and
an
internal
cooler
that
is installed inside of
s
e
c
t
i
o
n
,
the
upper
section
via
reactor
a
?ange
and
an
initially
charging
a
n
d
the
upper
reactor
the
loWer
reactor
section
Ma
y
10
,
20
12
US 2012/0114546 A1
cavely
to
form
a
smooth
round
inner
surface betWeen the
vertical
inner
surface of the loWer
and
reactor
and
equipped
pluralities
and
exit gas line from the top of the ?uidized bed reactor and
degrees,
and
and
and
system for separating TCS and STC comes from the
and
a ?rst separator system that separates the STC and
TCS from the hydro chlorination FBR,
and
produced from the direct chlorination FBR that uses
hybrid
TCS-Siemens
for
building
an
MGSI
feeder
controls
of
that
feeding
the
rate
silicon
at
deviation
pressure
r
e
a
c
t
o
r
of
at
150
Pisa
bed
reactor
point
just
loWer
reactor
section
With
from
vertical
smaller
an
angle
line
than
20
degrees,
and
an
initial
charging
betWeen
the
material at a range of
reactor
100
loWer
of
section
expands
degree
and
Kg/hr
With
+5%
deviation at a pressure
150
connected
Pisa
and
to
is
the
and
a
cyclone
connected
that
to
is
the
and
u
p
p
e
r
upper
reactor
bed reactor,
upper
and
and
the
charging
process
initially
a
n
d
an
and
s
e
c
t
i
o
n
,
and
a
n
turbo charger.
With
gas
of
chevron
shape
gas hole caps that
of
holes of diameter 2
mm
andpluralities
2.
and
gas
plate
Which is installed
at the bottom of the
line that reaches a point just below the upper end of the
and
section
the
distribution
until
the
inner
diameter
(D2)
of
the upper reactor
section reaches tWo
times of the inner
diameter
(D1)
of
the loWer reactor
section,
gas
distribution
plate,
Whose
brim
is
rounded
con
line
that
reactor section
chlorination FBR,
from
and
degrees,
a second separator
system that separates
TCS and STC produced
are
installed
along
the
height
of
the
FBR
to
get
real-time
and
a hydro chlorination FBR for converting STC (Silicon
and
3.
hybrid
process
polysili
in
and
a off gas recovery system that also includes a separator
system for separating TCS and STC comes from the
and
a ?rst separator system that separates the STC and
pro
duced
4.
process
TCS-Siemens
for
con
separator
system
from
the
direct
FBR
that
uses
charger
are
one
separator system.
hybrid
larger
economically
building
scale
of
TCS-Siemens
for
producing
pluralities of CVD (Chemical Vapor Deposition) reactors 10,000 MT/YR of claims 1 and 2,
for depositing silicon from TCS introduced,
hydro
turbo
turbo
charger.
A
second
chlorination
the
and
than
10,000
and
MT/Y
save
more
hybrid
TCS-Siemens
for separating
compared
to
Process
that
CVD
reactors,
separator
the
system
?rst
that
old
TCS-Siemens
uses
thermal
converters for
STC conversion to
TCS.