5/10/13 Process Control and Instrumentation Section 2 - Chemical Engineering Questions and Answers Page 5

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Chemical Engineering :: Process Control and

Instrumentation
@ : Home > Chemical Engineering > Process Control and Instrumentation > Section 2

21. Pick out the wrong statement

A. Proportional controller is normally used for level control in industrial applications.
B. CSTR can be considered as a distributed parameter system.
C. Distributed parameter approach gives partial differential equation.
D. Non-linear behaviour is exemplified by an on-off controller.
Answer & Explanation

Answer: Option B

Explanation:

No answer description available for this question. Let us discuss.

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22. Range of hydrogen gas constant volume themometer is __________ °C.

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5/10/13 Process Control and Instrumentation Section 2 - Chemical Engineering Questions and Answers Page 5
22. Range of hydrogen gas constant volume themometer is __________ °C.
A. -10 to 20
B. 0 to 100
C. 100 - 500
D. 400 - 1000
Answer & Explanation

Answer: Option B

Explanation:

No answer description available for this question. Let us discuss.

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23. The initial value (t=0) of the unit step response of the transfer function [(s + 1)/(2s + 1)] is
A.0 B.1/2
C.1 D.2
Answer & Explanation

Answer: Option B

Explanation:
Exercise No answer description available for this question. Let us discuss.

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Section 2
Section 3 24. The __________ of a vapor pressure thermometer is a primary element.
Section 4 A. pointer

Section 5 B. Bourdon tube

Section 6 C. bulb
Section 7 D. none of these
Answer & Explanation
"Forgiveness is a virtue of the brave."
- Indira Gandhi Answer: Option C

Explanation:

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25. The time constant of a first order process with resistance R and capacitance C is
A. R + C
B. R - C
C. RC
D. 1/RC
Answer & Explanation

Answer: Option C

Explanation:

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5/10/13 Process Control and Instrumentation Section 2 - Chemical Engineering Questions and Answers Page 5
Read more:

Process Control and Instrumentation - Section 3

Process Control and Instrumentation - Section 4
Process Control and Instrumentation - Section 5
Process Control and Instrumentation - Section 6
Process Control and Instrumentation - Section 7

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